9-Semi-automatic Quartz Wafer Ultrasonic Cleaning Ma
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Specification:
Semi-automatic Quartz Wafer Ultrasonic Cleaning Ma
Specification:Semi-automatic Quartz Wafer Ultrasonic Cleaning Ma
NO：
INFO：
- For Optical, Wafer, Optoelectronics Panel Industry.
- Anhydrous marks cleaning.
- Can be equipped with Single-arm type crane, suitable for cleaning a small amount of light weight parts or items, flexible adjustment of cleaning process time.
- Ultrasonic cleaning with high efficiency, can save time and human resource.
- Cleaning room class materials and manufacturing methods.
- Can be equipped with heating, filtering, overflow, swing, wind shear, and other functions according to requirements.
More-Details:
• Product Description •
Features :
- Whole machine PP enclosure + semi-closed vent a hood design, confirm the safety of operation environment.
- Colorful touch interface (HMI), the operation is simple and convenience.
- The size of tank and equipped functions can be adjusted according to customer’s requirements.
- The material of tank : SUS304, SUS316, SUS316L, PP, Ti.
(According to using cleaning agents, provide the appropriate material and structure design)
- The design of the machine can meet the requirements of operators' height and using habits.
Application :
- For Optical, Wafer, optoelectronics Panel Industry.
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